In situ x-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti-Al-N thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 5, 2005, Pages 1384-1391

  Beckers, M ^a   Schell, N ^a   Martins, R M S ^a   Mucklich A ^a   Moller W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM NITRIDE; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; NANOSTRUCTURED MATERIALS; SPUTTER DEPOSITION; TEXTURES; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

DEPOSITION CHAMBER; PARAMETER CONSTANTS; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 31144457848     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2011400     Document Type: Article

References (27)

1. W. D. Münz, J. Vac. Sci. Technol. A 4, 2717 (1986).
2. O. Knotek, W. D. Münz, and T. Leyendecker, J. Vac. Sci. Technol. A 5, 2173 (1987).
3. L. Hultman, Vacuum 57, 1 (2000).
4. R. Cremer, M. Witthaut, A. v. Richthofen, and D. Neuschütz, Fresenius' J. Anal. Chem. 361, 642 (1998).
5. J. Musil and H. Hrubý, Thin Solid Films 365, 104 (2000).
6. J.-E. Sundgren, Thin Solid Films 128, 21 (1985).
7. Y. Kajikawa, S. Noda, and H. Komiyama, J. Vac. Sci. Technol. A 216, 1943 (2003).
8. I. Petrov, P. B. Barna, L. Hultman, and J. E. Greene, J. Vac. Sci. Technol. A 215, 117 (2003).
9. J. Pelleg, L. Z. Zevin, S. Lungo, and N. Croitoru, Thin Solid Films 197, 117 (1991).
10. D. Gall, S. Kodambaka, M. A. Wall, I. Petrov, and J. E. Greene, J. Appl. Phys. 93, 9086 (2003).
11. V. Valvoda, R. Kuzel, R. Ceroy, and J. Musil, Thin Solid Films 156, 53 (1988).
12. N. Schell, W. Matz, J. Bøttiger, J. Chevallier, and P. Kringhøj, J. Appl. Phys. 91, 2037 (2002).
13. G. Abadias and Y. Y. Tse, J. Appl. Phys. 95, 2414 (2004).
14. J. E. Greene, J.-E. Sundgren, L. Hultman, I. Petrov, and D. B. Bergstrom, Appl. Phys. Lett. 67, 2928 (1995).
15. L. Hultman, J.-E. Sundgren, J. E. Greene, D. B. Bergstrom, and I. Petrov, J. Appl. Phys. 78, 5395 (1995).
16. F. H. Baumann, D. L. Chopp, T. Díaz de la Rubia, G. H. Gilmer, J. E. Greene, H. Huang, S. Kodambaka, P. O'Sullivan, and I. Petrov, MRS Bull. 26, 182 (2001).
17. F. Adibi, I. Petrov, J. E. Greene, L. Hultman, and J.-E. Sundgren, J. Appl. Phys. 73, 8580 (1993).
18. W. Matz, N. Schell, W. Neumann, J. Bøttiger, and J. Chevallier, Rev. Sci. Instrum. 72, 3344 (2001).
19. M. Beckers, N. Schell, R. M. S. Martins, A. Mücklich, and W. Möller, J. Appl. Phys. (in press).
20. http://www.rzg.mpg.de/~mam/
21. W. C. Oliver and G. M. Pharr, J. Mater. Res. 7, 1564 (1992).
22. http://www.bede.co.uk
23. http://www.spss.com
24. B. K. Gan, M. M. M. Bilek, D. R. McKenzie, M. B. Taylor, and D. G. McCulloch, J. Phys.: Condens. Matter 16, 1751 (2004).
25. F. Elstner, A. Ehrlich, H. Giegengack, H. Kupfer, and F. Richter, J. Vac. Sci. Technol. A 12, 476 (1994).
26. A. Madan, I. W. Kim, S. C. Cheng, P. Yashar, V. P. Dravid, and S. A. Barnett, Phys. Rev. Lett. 78, 1743 (1997).
27. Nanomaterials: Synthesis, Properties and Applications, edited by, A. S. Edelstein, and, R. C. Cammarata, (Institute of Physics Publishing, Bristol, 1998).