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Surface and Coatings Technology

Volumn 180-181, Issue , 2004, Pages 9-14

Microstructure, oxidation and H2-permeation resistance of TiAlN films deposited by DC magnetron sputtering technique

(4) Man, B Y a,b Guzman, L a Miotello, A a Adami, M a

a UNIVERSITY OF TRENTO (Italy)

b SHANDONG NORMAL UNIVERSITY (China)

Author keywords

Hydrogen barrier; Oxidation behavior; TiAlN coatings

Indexed keywords

ALUMINUM COMPOUNDS; CARBON STEEL; MICROSTRUCTURE; OXIDATION; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TERNARY SYSTEMS; THERMAL LOAD; X RAY DIFFRACTION;

DC SPUTTERING; PROTECTING TOOLS;

PROTECTIVE COATINGS;

COATING; CORROSION RESISTANCE; MICROSTRUCTURE; OXIDATION; SPUTTERING; TITANIUM NITRIDE;

EID: 1842665106 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2003.10.021 Document Type: Article

Times cited : (89)

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