Microstructure and chemical state of Ti1-xYxN film deposited by reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2914-2921

  Choi, W S ^a   Hwang, S K ^a,b   Lee, C M ^a  

^a Inha University   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CRYSTAL MICROSTRUCTURE; ELECTRON ENERGY LEVELS; MAGNETRON SPUTTERING; MICROHARDNESS; OXIDATION RESISTANCE; SPUTTER DEPOSITION; TITANIUM DIOXIDE; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM;

CHEMICAL STATES; HARD COATINGS; REACTIVE MAGNETRON SPUTTERING;

PROTECTIVE COATINGS;

EID: 0034318316     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319680     Document Type: Article

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