Effects of Al content on hardness, lattice parameter and microstructure of Ti1-xAlxN films

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 438-441

  Kimura, Ayako ^a   Hasegawa, Hiroyuki ^a   Yamada, Kunihiro ^a   Suzuki, Tetsuya ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Arc ion plating method; Microhardness; Microstructure; Ti Al N films

Indexed keywords

COATING; FILM; ION PLATING; MICROSTRUCTURE;

EID: 0033509617     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00491-0     Document Type: Article

References (15)

1. Daalder J.E. Physica C. 104:1981;91.
2. Johnson P.C. Physics of Films. Vol. 14:1989;129 Academic Press, London.
3. Jehn H.A., Hofmann S., Rückborn V.E., Münz W.D. J. Vac. Sci. Technol. A. 4:1986;2701.
4. Münz W.D. J. Vac. Sci. Technol. A. 4:1986;2717.
5. Randhawa H., Johnson P.C., Cunningham R. J. Vac. Sci. Technol. A. 6:1988;2136.
6. Knotek O., Böhmer M., Leyendecker T. J. Vac. Sci. Technol. A. 4:1986;2695.
7. Knotek O., Böhmer M., Leyendecker T., Jungblut F. Mater. Sci. Eng. A. 105/106:1988;481.
8. Donohue L.A., Cawley J., Brooks J.S., Münz W.D. Surf. Coat. Technol. 74/75:1996;123.
9. Ikeda T., Satoh H. Thin Solid Films. 195:1991;99.
10. Tanaka Y., Gür T.M., Kelly M., Hagstrom S.B., Ikeda T., Wakihira K., Satoh H. J. Vac. Sci. Technol. A. 10:1992;1749.
11. Knotek O., Leyendecker T. J. Solid State Chem. 70:1987;318.
12. Wahlström U., Hultman L., Sundgren J.E., Adibi F., Petrov I., Greene J.E. Thin Solid Films. 235:1993;62.
13. Setsuhara Y., Suzuki T., Makino Y., Miyake S., Sakata T., Mori H. Nucl. Instrum. Meth. Phys. Res. B. 106:1995;120.
14. Suzuki T., Huang D., Ikuhara Y. Surf. Coat. Technol. 107:1998;41.
15. Håkansson G., Sundgren J.E., Mcintyre D., Greene J.E., Münz W.D. Thin Solid Films. 153:1987;55.