Experimental and theoretical characterization of an inductively coupled plasma source

Journal of Applied Physics

Volumn 90, Issue 2, 2001, Pages 587-598

  Scheubert, P ^a   Fantz, U ^a   Awakowicz, P ^a   Paulin, H ^a  

^a Tosoh SMD Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035878674     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1375009     Document Type: Article

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