메뉴 건너뛰기




Volumn , Issue , 2009, Pages 13-20

Physics and mechanisms of dielectric trap profiling by Multi-Frequency Charge Pumping (MFCP) method

Author keywords

Bulk trap; Charge pumping; High k dielectric; Trap profiling

Indexed keywords

BULK TRAP; BULK TRAPS; CHARGE PUMPING; COMPLEMENTARY METHODS; ELECTRON-HOLE RECOMBINATION; ENERGY SPACES; HIGH-K DIELECTRIC; MULTI FREQUENCY; NMOS TRANSISTORS; NUMERICAL MODELS; PULSE DURATIONS; SHORT CHANNELS; THEORETICAL STUDY; TRAP PROFILING; VOLTAGE LEVELS;

EID: 70449095966     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IRPS.2009.5173218     Document Type: Conference Paper
Times cited : (14)

References (28)
  • 1
    • 70449101338 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors, 2006.
    • "International Technology Roadmap for Semiconductors," 2006.
  • 2
    • 50249185641 scopus 로고    scopus 로고
    • A 45nm Logic Technology with High-k+ Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging
    • K. Mistry, C. Allen, C. Auth, et al., "A 45nm Logic Technology with High-k+ Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging," IEDM Tech. Dig., pp. 247-250, 2007.
    • (2007) IEDM Tech. Dig , pp. 247-250
    • Mistry, K.1    Allen, C.2    Auth, C.3
  • 3
    • 68249140548 scopus 로고    scopus 로고
    • Device and Reliability of HfSiON+LaOx/Metal Gate Stacks for 22 nm Node Application
    • J. Huang, P. D. Kirsch, D. Heh, et al., "Device and Reliability of HfSiON+LaOx/Metal Gate Stacks for 22 nm Node Application" IEDM Tech. Dig., pp. 45-48, 2008.
    • (2008) IEDM Tech. Dig , pp. 45-48
    • Huang, J.1    Kirsch, P.D.2    Heh, D.3
  • 4
    • 31044455312 scopus 로고    scopus 로고
    • High Dielectric Constant Gate Oxides for Metal Oxide Si Transistors
    • J. Robertson, "High Dielectric Constant Gate Oxides for Metal Oxide Si Transistors," Rep Prog Phys, vol. 69, pp. 327-396, 2006.
    • (2006) Rep Prog Phys , vol.69 , pp. 327-396
    • Robertson, J.1
  • 5
    • 51549110399 scopus 로고    scopus 로고
    • Comprehensive Studies of BTI Effects in CMOSFETs with SiON by New Measurement Technique
    • Z. Y. Liu, D. Huang, W. J. Liu, et al., "Comprehensive Studies of BTI Effects in CMOSFETs with SiON by New Measurement Technique," Proc IEEE IRPS, pp. 733-734, 2008.
    • (2008) Proc IEEE IRPS , pp. 733-734
    • Liu, Z.Y.1    Huang, D.2    Liu, W.J.3
  • 9
    • 0035696970 scopus 로고    scopus 로고
    • Study of low-frequency charge pumping on thin stacked dielectrics
    • C. E. Weintraub, E. Vogel, J. R. Hauser, et al., "Study of low-frequency charge pumping on thin stacked dielectrics," IEEE Trans. Electron Devices, vol. 48, pp. 2754-2762, 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 2754-2762
    • Weintraub, C.E.1    Vogel, E.2    Hauser, J.R.3
  • 10
    • 19944376504 scopus 로고    scopus 로고
    • New Charge Pumping model for the analysis of the spatial trap distribution in the nitride layer of SONOS devices
    • A. Arreghini, F. Driussi, D. Esseni, et al., "New Charge Pumping model for the analysis of the spatial trap distribution in the nitride layer of SONOS devices," Microelectron Eng, vol. 80, pp. 333-336, 2005.
    • (2005) Microelectron Eng , vol.80 , pp. 333-336
    • Arreghini, A.1    Driussi, F.2    Esseni, D.3
  • 11
    • 34548716440 scopus 로고    scopus 로고
    • 2 Technologies by Charge Pumping Measurements and Electrical Modeling
    • 2 Technologies by Charge Pumping Measurements and Electrical Modeling," Proc IEEE IRPS, pp. 61-66, 2007.
    • (2007) Proc IEEE IRPS , pp. 61-66
    • Garros, X.1    Mitard, J.2    Leroux, C.3
  • 12
    • 34249906151 scopus 로고    scopus 로고
    • Spatial distributions of trapping centers in HfO2/SiO2 gate stack
    • D. Heh, C. D. Young, G. A. Brown, et al., "Spatial distributions of trapping centers in HfO2/SiO2 gate stack," IEEE Trans. Electron Devices, vol. 54, pp. 1338-1345, 2007.
    • (2007) IEEE Trans. Electron Devices , vol.54 , pp. 1338-1345
    • Heh, D.1    Young, C.D.2    Brown, G.A.3
  • 15
    • 51549086985 scopus 로고    scopus 로고
    • R. O'Connor, L. Pantisano, R. Degraeve, et al., SILC Defect Generation Spectroscopy in HfSiON using Constant Voltage Stress and Substrate Hot Electron Injection, Proc IEEE IRPS, pp. 4A.2, 2008.
    • R. O'Connor, L. Pantisano, R. Degraeve, et al., "SILC Defect Generation Spectroscopy in HfSiON using Constant Voltage Stress and Substrate Hot Electron Injection," Proc IEEE IRPS, pp. 4A.2, 2008.
  • 16
    • 0035367152 scopus 로고    scopus 로고
    • Characterization of Soft Breakdown in Thin Oxide NMOSFETs Based on the Analysis of the Substrate Current
    • F. Crupi, G. Iannaccone, I. Crupi, et al., "Characterization of Soft Breakdown in Thin Oxide NMOSFETs Based on the Analysis of the Substrate Current," IEEE Trans. Electron Devices, vol. 48, pp. 1109-1113, 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 1109-1113
    • Crupi, F.1    Iannaccone, G.2    Crupi, I.3
  • 17
    • 34248678731 scopus 로고    scopus 로고
    • Characterization of Electrically Active Defects in High-k Gate Dielectrics by Using Low Frequency Noise and Charge Pumping Measurements
    • H. D. Xiong, D. Heh, M. Gurfinkel, et al., "Characterization of Electrically Active Defects in High-k Gate Dielectrics by Using Low Frequency Noise and Charge Pumping Measurements," Microelectron Eng, vol. 84, pp. 2230-2234, 2007.
    • (2007) Microelectron Eng , vol.84 , pp. 2230-2234
    • Xiong, H.D.1    Heh, D.2    Gurfinkel, M.3
  • 18
    • 64549147008 scopus 로고    scopus 로고
    • Trap Spectroscopy by Charge Injection and Sensing (TSCIS): A Qualitative Electrical Technique for Studying Defects in Dielectric Stacks
    • R. Degraeve, M. Cho, B. Govoreanu, et al., "Trap Spectroscopy by Charge Injection and Sensing (TSCIS): A Qualitative Electrical Technique for Studying Defects in Dielectric Stacks ," IEDM Tech. Dig., pp. 775-778, 2008.
    • (2008) IEDM Tech. Dig , pp. 775-778
    • Degraeve, R.1    Cho, M.2    Govoreanu, B.3
  • 19
    • 0021201529 scopus 로고
    • A Reliable Approach to Charge-Pumping Measurements in Mos-Transistors
    • G. Groeseneken, H. E. Maes, N. Beltran, et al., "A Reliable Approach to Charge-Pumping Measurements in Mos-Transistors," IEEE Trans. Electron Devices, vol. 31, pp. 42-53, 1984.
    • (1984) IEEE Trans. Electron Devices , vol.31 , pp. 42-53
    • Groeseneken, G.1    Maes, H.E.2    Beltran, N.3
  • 20
    • 70449103657 scopus 로고    scopus 로고
    • personal communication
    • R. Degraeve, personal communication, 2008.
    • (2008)
    • Degraeve, R.1
  • 21
    • 0027558426 scopus 로고    scopus 로고
    • G. Van den bosch, G. Groeseneken and H. E. Maes, On the Geometric Component of Charge-Pumping Current in MOSFETs, IEEE Electron Device Lett., 14, pp. 107-109, 1993.
    • G. Van den bosch, G. Groeseneken and H. E. Maes, "On the Geometric Component of Charge-Pumping Current in MOSFETs", IEEE Electron Device Lett., vol. 14, pp. 107-109, 1993.
  • 22
    • 57149126233 scopus 로고    scopus 로고
    • Exploring the Capability of Multi-Frequency Charge Pumping in Resolving Location and Energy Levels of Traps within Dielectric
    • M. Masuduzzaman, A. E. Islam and M. A. Alam, "Exploring the Capability of Multi-Frequency Charge Pumping in Resolving Location and Energy Levels of Traps within Dielectric," IEEE Trans. Electron Devices, vol. 55, pp. 3421-3431, 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , pp. 3421-3431
    • Masuduzzaman, M.1    Islam, A.E.2    Alam, M.A.3
  • 23
    • 0033284985 scopus 로고    scopus 로고
    • Self- consistent simulation of quantization effects and tunneling current in ultra-thin gate oxide MOS devices
    • A. Ghetti, A. Hamad, P. J. Silverman, et al., "Self- consistent simulation of quantization effects and tunneling current in ultra-thin gate oxide MOS devices," SISPAD, pp. 239-242, 1999.
    • (1999) SISPAD , pp. 239-242
    • Ghetti, A.1    Hamad, A.2    Silverman, P.J.3
  • 25
    • 0016927127 scopus 로고
    • Capture Cross-Section and Trap Concentration of Holes in Silicon Dioxide
    • T. H. Ning, "Capture Cross-Section and Trap Concentration of Holes in Silicon Dioxide," J. Appl. Phys., vol. 47, pp. 1079-1081, 1976.
    • (1976) J. Appl. Phys , vol.47 , pp. 1079-1081
    • Ning, T.H.1
  • 26
    • 20644440412 scopus 로고    scopus 로고
    • Threshold voltage instabilities in high-k gate dielectric stacks
    • S. Zafar, A. Kumar, E. Gusev, et al., "Threshold voltage instabilities in high-k gate dielectric stacks," IEEE Trans. on Dev. and Mat. Rel., vol. 5, pp. 45-64, 2005.
    • (2005) IEEE Trans. on Dev. and Mat. Rel , vol.5 , pp. 45-64
    • Zafar, S.1    Kumar, A.2    Gusev, E.3
  • 27
    • 0001663476 scopus 로고    scopus 로고
    • Tunneling into interface states as reliability monitor for ultrathin oxides
    • A. Ghetti, E. Sangiorgi, J. Bude, et al., "Tunneling into interface states as reliability monitor for ultrathin oxides," IEEE Trans. Electron Devices, vol. 47, pp. 2358-2365, 2000.
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 2358-2365
    • Ghetti, A.1    Sangiorgi, E.2    Bude, J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.