In-situ negatively nanopatterning alkylated silicon (111) surface by conductive atomic force microscope

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 8, 2009, Pages 4618-4622

  Wang, Haitao ^a   Zhang, Yong ^a   Tian, Tian ^a   Xiao, Zhongdang ^a  

^a SOUTHEAST UNIVERSITY   (China)

Author keywords

AFM local oxidation; Nanolithography; Negative nanopattern

Indexed keywords

AFM LITHOGRAPHY; AFM LOCAL OXIDATION; APPLIED BIAS; CONDUCTIVE ATOMIC FORCE MICROSCOPES; ETHANOL TREATMENT; IN-SITU; NANO PATTERN; NANOPATTERNING; NEGATIVE NANOPATTERN; PORE FORMATION; PULSE DURATIONS; RESIST LAYERS; SAMS; SI (1 1 1); SILICON (111) SURFACE; SILICON SUBSTRATES; TIP BIAS; WET-CHEMICAL ETCHING;

ACOUSTIC MICROSCOPES; ATOMIC FORCE MICROSCOPY; ELECTRIC FIELDS; ETHANOL; NANOLITHOGRAPHY; OXIDATION; SELF ASSEMBLED MONOLAYERS;

SILICON;

SILICON;

ALKYLATION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; METHODOLOGY;

ALKYLATION; MICROSCOPY, ATOMIC FORCE; SILICON;

EID: 70350351551     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.1286     Document Type: Article

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