Effect of solvent and dopant on poly(3,4-ethylenedioxythiophene) thin films by atomic force microscope lithography

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 9, 2008, Pages 4757-4760

  Kim, Yong Il ^a   Kim, Hyunsook ^a   Lee, Haiwon ^a  

^a Hanyang University   (South Korea)

Author keywords

AFM lithography; Conducting polymer; Poly(3,4 ethylenedioxythiophene)

Indexed keywords

AFM LITHOGRAPHY; ANODIZATION LITHOGRAPHIES; ATOMIC FORCE MICROSCOPE LITHOGRAPHIES; ETHYLENE DIOXYTHIOPHENE; NANOPATTERNS; ORGANIC THIN FILMS; POLY(3,4-ETHYLENEDIOXYTHIOPHENE); SILICON OXIDES; SILICON SURFACES; STYRENE SULFONATES; SULFOSUCCINATE; V CURVES;

ABS RESINS; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CONDUCTING POLYMERS; CONDUCTIVE PLASTICS; DOPING (ADDITIVES); LITHOGRAPHY; MICROSCOPIC EXAMINATION; ORGANIC COMPOUNDS; ORGANIC CONDUCTORS; ORGANIC POLYMERS; ORGANIC SOLVENTS; OXIDE FILMS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON COMPOUNDS; SOLIDS; SOLVENTS; THICK FILMS; THIN FILMS;

CONDUCTIVE FILMS;

EID: 55849090671     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.IC06     Document Type: Conference Paper

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