The effect of monolayers' alkyl chain length on atomic force microscopy anodization lithography

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 253, Issue 1-3, 2005, Pages 23-26

  Kim, Bumsu ^a   Pyrgiotakis, Georgios ^a   Sauers, Jason ^a   Sigmund, Wolfgang M ^a  

^a University of Florida   (United States)

Author keywords

Alkylsilane; Anodization; Atomic force microscopy; Monolayer; Nanolithography

Indexed keywords

ALKYLATION; ATOMIC FORCE MICROSCOPY; DEGRADATION; NANOTECHNOLOGY; SILANES; SOCIETIES AND INSTITUTIONS; THRESHOLD VOLTAGE;

ALKYLSILANE MONOLAYERS; ANODIZATION LITHOGRAPHY; ELECTRICAL ENERGY; ENERGY OFFSET;

MONOLAYERS;

ALKYL GROUP; SILANE DERIVATIVE;

ALPHA CHAIN; ARTICLE; ATOMIC FORCE MICROSCOPY; CORRELATION ANALYSIS; DEGRADATION KINETICS; ELECTRIC POTENTIAL; ELECTRICITY; ELECTRODE; ENERGY YIELD; IONIZATION; MAXIMUM ALLOWABLE CONCENTRATION; MOLECULAR DYNAMICS; MOLECULAR INTERACTION; MONOLAYER CULTURE; PRIORITY JOURNAL; REACTION ANALYSIS; TECHNIQUE;

EID: 12344316673     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2004.10.079     Document Type: Article

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