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Volumn 123, Issue 32, 2001, Pages 7887-7889
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"Dip-pen" Nanolithography on semiconductor surfaces
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Author keywords
[No Author keywords available]
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Indexed keywords
LATER FORCE MICROSCOPY (LFM);
DEPOSITION;
GOLD;
MONOLAYERS;
ORGANIC COMPOUNDS;
POLYMERIZATION;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTOR MATERIALS;
NANOTECHNOLOGY;
GALLIUM ARSENIDE;
GOLD;
HEXAMETHYLDISILAZANE;
INK;
SILANE DERIVATIVE;
SILICON DERIVATIVE;
THIOL DERIVATIVE;
UNCLASSIFIED DRUG;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
CHEMICAL STRUCTURE;
METHODOLOGY;
MICROSCOPY;
SEMICONDUCTOR;
GOLD;
INK;
MICROSCOPY, ATOMIC FORCE;
ORGANOSILICON COMPOUNDS;
OXIDATION-REDUCTION;
SEMICONDUCTORS;
SULFHYDRYL COMPOUNDS;
SURFACE PROPERTIES;
WRITING;
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EID: 0034815819
PISSN: 00027863
EISSN: None
Source Type: Journal
DOI: 10.1021/ja010671c Document Type: Article |
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Times cited : (197)
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References (15)
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