Fabrication of nanostructure on a polymer film using atomic force microscope

Journal of Nanoscience and Nanotechnology

Volumn 7, Issue 6, 2007, Pages 2172-2175

  Jegadesan, Subbiah ^a   Sindhu, Swaminathan ^a   Valiyaveettil, Suresh ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

AFM; Electrostatic nanolithography; Nanopattern; PAA; PMAA; Polymer film

Indexed keywords

(I ,J) CONDITIONS; APPLIED POTENTIALS; ATOMIC FORCE MICROSCOPE (AFM); NANO STRUCTURING; NANO-DEVICES; NANO-PATTERNING; RELIABLE METHOD; SI(2 1 1) SUBSTRATES; SILICON (111) SUBSTRATES;

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; CHEMICALS; EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; METALS; NANOLITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OPTICAL DESIGN; PLASTIC FILMS; POLYMER FILMS; POLYMERS;

SUBSTRATES;

ACRYLIC ACID RESIN; CARBOPOL 940; NANOMATERIAL; POLY(METHYL METHACRYLATE); POLYMER;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

ACRYLIC RESINS; CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; POLYMERS; POLYMETHYL METHACRYLATE; SURFACE PROPERTIES;

EID: 34548423606     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2007.789     Document Type: Conference Paper

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