Chemical resistivity of self-assembled monolayer covalently attached to silicon substrate to hydrofluoric acid and ammonium fluoride

Surface Science

Volumn 532-535, Issue , 2003, Pages 970-975

  Saito, N ^a   Youda, S ^a   Hayashi, K ^a   Sugimura, H ^a   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Halides; Self assembly; Silicon

Indexed keywords

CHEMICAL RESISTANCE; CHEMICAL VAPOR DEPOSITION; FLUORIDE MINERALS; OPTICAL MICROSCOPY; PHOTOLITHOGRAPHY; SEMICONDUCTING SILICON; SILANES; SURFACE REACTIONS;

MICRO-PATTERNING;

SELF ASSEMBLY;

EID: 0038521747     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00158-4     Document Type: Conference Paper

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