Process liability evaluation for extreme ultraviolet lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Aoyama, Hajime ^a   Tawarayama, Kazuo ^a   Tanaka, Yuusuke ^a   Kawamura, Daisuke ^a   Arisawa, Yukiyasu ^a   Uno, Taiga ^a   Kamo, Takashi ^a   Tanaka, Toshihiko ^a   Itani, Toshiro ^a   Tanaka, Hiroyuki ^a   Nakajima, Yumi ^b   Inanami, Ryoichi ^b   Takai, Kosuke ^b   Murano, Koji ^b   Koshiba, Takeshi ^b   Hashimoto, Kohji ^b   Mori, Ichiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Correction; Device fabrication; EUV1; Extreme ultraviolet lithography; Flare; Process liability

Indexed keywords

EXPOSURE METERS; FABRICATION; MASKS; OPTICAL TRANSFER FUNCTION; TUNGSTEN; ULTRAVIOLET DEVICES;

CORRECTION; DEVICE FABRICATION; EUV1; FLARE; PROCESS LIABILITY;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 70349898765     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3238542     Document Type: Article

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