Lithographic flare measurements of EUV full-field projection optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 103-111

  Lee, Sang H ^a   Naulleau, Patrick ^b   Krautschik, Chris ^a   Chandhok, Manish ^a   Chapman, Henry N ^c   O'Connell, Donna J ^d   Goldstein, Michael ^a  

^a INTEL CORPORATION   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Extreme ultraviolet lithography; Flare; H V flare bias; Kirk method; Power spectral density (PSD); Scattered point spread function (PSF)

Indexed keywords

ANISOTROPY; CALCULATIONS; COMPUTER SIMULATION; DIFFRACTIVE OPTICS; MIRRORS; OPTICAL VARIABLES MEASUREMENT; PHOTORESISTS; ULTRAVIOLET RADIATION;

ENGINEERING TEST STAND; EXTREME ULTRAVIOLET LITHOGRAPHY; FLARE; HORIZONTAL AND VERTICAL FLARE BIAS; KIRK METHOD; POWER SPECTRAL DENSITY; SCATTERED POINT SPREAD FUNCTION;

LITHOGRAPHY;

EID: 0141794542     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485547     Document Type: Conference Paper

References (12)

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