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Japanese Journal of Applied Physics

Volumn 48, Issue 5, 2009, Pages 0565101-0565105

Flare impact and correction for critical dimension control with full-field exposure tool

(6) Aoyama, Hajime a Tanaka, Yuusuke a Tawarayama, Kazuo a Arisawa, Yukiyasu a Tanaka, Toshihiko a Mori, Ichiro a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CD ERRORS; CD VARIATION; CRITICAL DIMENSION CONTROL; EXTREME ULTRA-VIOLET LITHOGRAPHY; FEATURE SIZES; FLARE VARIATION COMPENSATION; FULL-FIELD; GAUSSIAN FUNCTIONS; LAYER PATTERNS; LOCAL DENSITY; MASK PATTERNS; PROJECTION OPTICS; RESIST BLUR; STATIC RANDOM ACCESS MEMORY;

MASKS; POWER SPECTRAL DENSITY; PULSE SHAPING CIRCUITS; RANDOM ACCESS STORAGE;

DATA STORAGE EQUIPMENT;

EID: 68349120447 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.056510 Document Type: Article

Times cited : (9)

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