Flare compensation for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Arisawa, Yukiyasu ^a   Aoyama, Hajime ^a   Uno, Taiga ^a   Tanaka, Toshihiko ^a   Mori, Ichiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Correction; EUV1; EUVL; Flare; PSF

Indexed keywords

CORRECTION; EUV1; EUVL; FLARE; PSF;

OPTICAL TRANSFER FUNCTION;

EID: 67149140489     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814187     Document Type: Conference Paper

References (5)

1. Krautschik, C, Masaaki, I., Nishiyama, I. and Okazaki, S., Impact of EUV light scatter on CD control as a result ofmask density," Proc. SPIE 4688, 289-301 (2002).
2. Krautschik, C, Chandhok, M., Zhang, G., Lee, S., Goldstein, M., Panning, E., Rice, B., Bristol, R. and Singh, V., Implementing flare compensation for EUV masks through localized mask CD resizing," Proc. SPIE 5037, 58-68(2003).
3. Word, J., Belledent, J., Trouiller, Y., Maurer, W., Granik, Y., Sahouria, E. and Toublan, O., Full chip model based correction of flare-induced linewidth variation," Proc. SPIE 5567,700-710 (2004).
4. Schellenberg, F., M., Word, J. and Toublan, O., Full chip model based correction of flare-induced linewidth variation, Proc. SPIE 5751, 320-329 (2005). (Pubitemid 41352029)
5. Aoyama, H., Tawarayama, K., Tanaka, Y., Kawamura, D., Arisawa, Y., Uno, T., Kamo, T., Tanaka, T., Itani, T., Tanaka, H., Nakajima, Y., manami, R., Takai, K., Murano, K., Koshiba, T., Hashimoto K. and Mori, L, Process liability evaluation for EUVL, this proceedings, [7271-74],