Path to the HVM in EUVL through the development and evaluation of the SFET

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Uzawa, Shigeyuki ^a   Kubo, Hiroyoshi ^a   Miwa, Yoshinori ^a   Tsuji, Toshihiko ^a   Morishima, Hideki ^a  

^a CANON INC   (Japan)

Author keywords

EUV lithography; Exposure tool; Ion beam figuring; Multiplayer coating; PDI; Wavefront

Indexed keywords

OPTICS; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY TRANSFER; WAVEFRONTS;

EXPOSURE TOOLS; ION BEAM FIGURING; MULTIPLAYER COATING; SMALL FIELD EXPOSURE TOOL (SFET);

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148863105     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711650     Document Type: Conference Paper

References (8)

1. Seiji Takeuchi et al, "Visible light point-diffraction interferometer for testing of EUVL optics" Proceeding of SPIE 61510E-1(2006).
2. Michael A. Johnson et al, "Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems", Proceeding of SPIE 58690P-1(2005).
3. Donald W. Phillion et al, "Calibration of symmetric and non-symmetric errors for interferometry of ultra-precise imaging system", Proceeding of SPIE 58690R-1(2005).
4. Manabu Ando et al, "IBF technology development for EUVL mirrors", 2006 International EUVL Symposium.
5. Fumitaro Masaki et al, "At wavelength evaluation of multiplayer for EUV lithography", 2006 International EUVL Symposium.
6. Masami Yonekawa et al, "A short-pulsed laser cleaning system for EUVL tool", SPIE 6517-103 (2007).
7. Takahiro Sasaki et al, "Performance estimation of EUV exposure optics for below 32-nm node in consideration of Mo/Si multiplayer", SPIE 6517-60 (2007)
8. S.Matsunari et al, "Carbon deposition on multiplayer mirrors by extreme ultra-violet ray irradiation", SPIE 6517-107(2007)