Novel molecular resist based on an amorphous truxene derivative

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Hattori, Shigeki ^a   Saito, Satoshi ^a   Asakawa, Koji ^a   Koshiba, Takeshi ^a   Nakasugi, Tetsuro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

70 nm line and space positive pattern; Amorphous solid; Electron beam; LER; Molecular resist; Truxene derivative

Indexed keywords

ELECTRON BEAMS; ELECTRON GUNS; GLASS TRANSITION; PARTICLE BEAMS; PHOTORESISTS; TURBULENT FLOW;

70 NM LINE-AND-SPACE POSITIVE PATTERN; AMORPHOUS SOLID; LER; MOLECULAR RESIST; TRUXENE DERIVATIVE;

AMORPHOUS MATERIALS;

EID: 57349177086     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.770944     Document Type: Conference Paper

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