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Applied Physics Letters

Volumn 95, Issue 10, 2009, Pages

Origin of frequency-dependent line edge roughness: Monte Carlo and fast Fourier-transform studies

(3) Saeki, Akinori a Kozawa, Takahiro a Tagawa, Seiichi a

a OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BASE QUENCHERS; CHEMICALLY AMPLIFIED RESIST; ELECTRICAL CIRCUIT; EXPOSURE DOSE; FREQUENCY COMPONENTS; FREQUENCY-DEPENDENT; LINE EDGE ROUGHNESS; LOW FREQUENCY; MESOSCALE; MONTE CARLO; POSITIVE-TONE; RESIST PROCESS;

DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MONTE CARLO METHODS; PHOTORESISTORS; PHOTORESISTS;

ROUGHNESS MEASUREMENT;

EID: 70249092517 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3225149 Document Type: Article

Times cited : (6)

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