Status of EUV lithography at IMEC

Journal of Photopolymer Science and Technology

Volumn 20, Issue 3, 2007, Pages 383-392

  Goethals, A M ^a   Jonckheere, R ^a   Lorusso, G F ^a   Hermans, J ^a   Van Roey, F ^a   Myers, A ^b   Niroomand, A ^c   Kim, I ^d   Iwamoto, F ^e   Stepanenko, N ^f   Ronse, K ^a  

^a IMEC   (Belgium)

^b INTEL CORPORATION   (United States)

^c MICRON TECHNOLOGY INC   (United States)

^d SAMSUNG Electronics   (South Korea)

^e PANASONIC CORPORATION   (Japan)

^f Qimonda ^*  (Germany)

Author keywords

Defect printability; EUV lithography; EUV resists; EUV reticles; Flare mitigation; Interference lithography; Shadowing effect

Indexed keywords

EID: 36148965873     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.383     Document Type: Article

References (19)

1. H. Meiling, et al., Proc. SPIE, 6151 (2006), 615108.
2. N. Harned et al, Proc. SPIE 6517, (2007), 651706
3. H.H. Solak et al, Microelectronic Engineering 67-68 (2003), 56-62.
4. Roel Gronheid et al., Microelectronic Engineering 83 (2006), 1103-1106
5. A.M. Goethals et al, J. Photopolym. Sci. Technol., vol.19 No 4 (2006), 501-506
6. D. Van Steenwinckel et al, Proc. SPIE 5753, (2005), 269-280
7. J.H. Lammers et al, Proc. SPIE 6519, (2007) , to be published 6519-31
8. R. Jonckheere et al, "Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future", EMLC, Grenoble, (2007), in press
9. U. Dersch, "The integrated EUV mask process at the Advanced Mask Technology Center (AMTC) in Dresden", EUVL Symposium, IN-11, San Diego, (2005)
10. M. Chandhok et. al., Proc. SPIE, 5037, (2004), 58-68
11. M. Chandhok et al., Proc SPIE 5374, (2004), 86-95
12. M. Chandhok et al, , JVST B 22(6), 2966-2969
13. A. M. Goethals et al., Proc SPIE 6517, (2007), 651709
14. K. Otaki, Jpn. J. Appl. Phys. Vol. 39 (2000), 6819-6826.
15. T.V. Pistor, A.R. Neureuther, R.J. Socha, SPIE 4000, (2000), 228- 237
16. M.Sugawara et al, J. Vac. Sci. Technol. B 21, (2003) 2701.
17. S. B. Bollepalli, M. Khan, and F. Cerrina, J. Vac. Sci. Technol. B 17, (1999), 2992.
18. U. Mickan, M. Lowisch, "Discussion of a simple EUV reticle model" EMLC (2005).
19. Chandhok, et al. US patent 7,022,443 (2006); J. Rau, US patent 6,707,123 (2004) , S. Schwarzl US patent 6,872,495 (2005), M. Lowisch, et al. US patent 7,042,550 (2006).