Optimization of photoacid generator in photoacid generation-bonded resist

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 47, Issue 8 PART 1, 2008, Pages 6293-6296

  Fukushima, Yasuyuki ^a   Watanabe, Takeo ^a   Ohnishi, Ryuji ^a   Shiotani, Hideaki ^a   Suzuki, Shota ^a   Hayakawa, Masamichi ^b   Endo, Yusuke ^b   Yamanaka, Tomotaka ^b   Yusa, Shinichi ^a   Kinoshita, Hiroo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOYO GOSEI CO LTD   (Japan)

Author keywords

Chemically amplified resist; LER; PAG; Resist; Sensitivity

Indexed keywords

ABS RESINS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTORESISTS; ROUGHNESS MEASUREMENT; ULTRAVIOLET DEVICES;

CHEMICALLY AMPLIFIED RESIST; LER; PAG; RESIST; SENSITIVITY;

PHOTORESISTORS;

EID: 55149089885     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.6293     Document Type: Article

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