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Journal of Photopolymer Science and Technology

Volumn 21, Issue 3, 2008, Pages 409-414

Current status and future direction of EUV resists

(4) Itani, Toshiro a Kawamura, Daisuke a Kaneyama, Koji a Kobayashi, Shinji a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

EUV resist; Line width roughness (LWR); Resist out gassing; Resolution limit; Sensitivity

Indexed keywords

EID: 50149104573 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.21.409 Document Type: Article

Times cited : (4)

References (14)

1
- 50149092597
- I. Mori, O. Suga, H. Tanaka, I. Nishiyama, T. Terasawa, H. Shigemura, T. Taguchi, T. Tanaka and T. Itani, Proc. SPIE 6921 (2008) 692102.
- (2008) Proc. SPIE , vol.6921 , pp. 692102
- Mori, I.¹ Suga, O.² Tanaka, H.³ Nishiyama, I.⁴ Terasawa, T.⁵ Shigemura, H.⁶ Taguchi, T.⁷ Tanaka, T.⁸ Itani, T.⁹

2
- 79959357002
- 69210P
- B. LaFontaine, Y. Deng, R. Kim, H. Levinson, S. McGowan, U. Okoroanyanwu, C. Tabery, T. Wallow, O. Wood, S. Bouten, M. Crouse, K. Cummings, J. Galloway, S. Han, B. Kessels, B. Lee, B. Niekrewicz, B. Pierson, R. Routh, K. Kimmel, C. Koay, K. Petrillo, J. Word, M. Sugawara, H. Mizuno, Proc. SPIE 6921 (2008) 69210P.
- (2008) Proc. SPIE , vol.6921
- LaFontaine, B.¹ Deng, Y.² Kim, R.³ Levinson, H.⁴ McGowan, S.⁵ Okoroanyanwu, U.⁶ Tabery, C.⁷ Wallow, T.⁸ Wood, O.⁹ Bouten, S.¹⁰ Crouse, M.¹¹ Cummings, K.¹² Galloway, J.¹³ Han, S.¹⁴ Kessels, B.¹⁵ Lee, B.¹⁶ Niekrewicz, B.¹⁷ Pierson, B.¹⁸ Routh, R.¹⁹ Kimmel, K.²⁰ more..

3
- 67149101887
- H. Meiling, V. Banine, K. Cummings, M. Goethals, N. Harned, B. Hultermans, P. Kürz, S. Lok, M. Lowisch, H. Meijer, U. Mickan, K. Ronse, J. Ryan, M. Tittnich, J. Zimmerman, Proc SPIE 6921 (2008) 69210L.
- (2008) Proc SPIE , vol.6921
- Meiling, H.¹ Banine, V.² Cummings, K.³ Goethals, M.⁴ Harned, N.⁵ Hultermans, B.⁶ Kürz, P.⁷ Lok, S.⁸ Lowisch, M.⁹ Meijer, H.¹⁰ Mickan, U.¹¹ Ronse, K.¹² Ryan, J.¹³ Tittnich, M.¹⁴ Zimmerman, J.¹⁵

4
- 47849128858
- T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo, Proc. SPIE 6921 (2008) 69210M.
- (2008) Proc. SPIE , vol.6921
- Miura, T.¹ Murakami, K.² Suzuki, K.³ Kohama, Y.⁴ Morita, K.⁵ Hada, K.⁶ Ohkubo, Y.⁷

5
- 50149110856
- S. Uzawa, H. Kubo, Y. Miwa, T. Tuji, T. Hasegawa, H. Morishima, Proc. SPIE 6921 (2008) 69210N.
- (2008) Proc. SPIE , vol.6921
- Uzawa, S.¹ Kubo, H.² Miwa, Y.³ Tuji, T.⁴ Hasegawa, T.⁵ Morishima, H.⁶

6
- 79959345348
- T. Wallow, R. Brainard, G. Denbeaux, C. Koay, W. Montgomery, K. Petrillo, Y. Wei and O. Wood, Proc. SPIE 6921 (2008) 69211F.
- (2008) Proc. SPIE , vol.6921
- Wallow, T.¹ Brainard, R.² Denbeaux, G.³ Koay, C.⁴ Montgomery, W.⁵ Petrillo, K.⁶ Wei, Y.⁷ Wood, O.⁸

7
- 57349120614
- D. Kawamura, K. Kaneyama, S. Kobayashi, J. J. Santillan and T. Itani, Proc. SPIE 6323 (2008) 692313.
- (2008) Proc. SPIE , vol.6323 , pp. 692313
- Kawamura, D.¹ Kaneyama, K.² Kobayashi, S.³ Santillan, J.J.⁴ Itani, T.⁵

8
- 35148883020
- P. Naulleau, C. Anderson, B. Fontaine, R. Kim, and T. Wallow, Proc. SPIE 6517, 65172N (2007).
- (2007) Proc. SPIE , vol.6517
- Naulleau, P.¹ Anderson, C.² Fontaine, B.³ Kim, R.⁴ Wallow, T.⁵

9
- 50149106058
- D. Kawamura, K. Kaneyama, S. Kobayashi, J. J. Santillan, and T. Itani, , EUVL Symp., RE05 (2007).
- (2007) EUVL Symp
- Kawamura, D.¹ Kaneyama, K.² Kobayashi, S.³ Santillan, J.J.⁴ Itani, T.⁵

10
- 50149105391
- G. Denbeaux, R. Garg, C. Mbanaso, J. Waterman, A. Antohe, L. Yankulin, Y. Fan, K. Dean and A. Wüest, Proc. SPIE 6921 (2008) 69211G.
- (2008) Proc. SPIE , vol.6921
- Denbeaux, G.¹ Garg, R.² Mbanaso, C.³ Waterman, J.⁴ Antohe, A.⁵ Yankulin, L.⁶ Fan, Y.⁷ Dean, K.⁸ Wüest, A.⁹

11
- 35148815291
- K. Dean, I. Nishiyama, H. Oizumi, A. Keen, H. Cao, W. Yueh, T. Watanabe, P. Lacovig, L. Rumiz, G. Denbeaux and J. Simon, Proc. SPIE, 6519 (2007) 65191P-1.
- (2007) Proc. SPIE , vol.6519
- Dean, K.¹ Nishiyama, I.² Oizumi, H.³ Keen, A.⁴ Cao, H.⁵ Yueh, W.⁶ Watanabe, T.⁷ Lacovig, P.⁸ Rumiz, L.⁹ Denbeaux, G.¹⁰ Simon, J.¹¹

12
- 36148964107
- S. Kobayashi, M. Toriumi, J. Santillan and T. Itani, J. Photopolym. Sci. Technol., 20 (2007) No.3, 445.
- (2007) J. Photopolym. Sci. Technol , vol.20 , Issue.3 , pp. 445
- Kobayashi, S.¹ Toriumi, M.² Santillan, J.³ Itani, T.⁴

13
- 57349198296
- S. Kobayashi, J. J. Santillan and T. Itani, Proc. SPIE 6323 (2008) 692345.
- (2008) Proc. SPIE , vol.6323 , pp. 692345
- Kobayashi, S.¹ Santillan, J.J.² Itani, T.³

14
- 57349152195
- submitted to
- J. J. Santillan, S. Kobayashi and T. Itani, submitted to Proc. of SPIE 6923 (2008) 692342.
- (2008) Proc. of SPIE , vol.6923 , pp. 692342
- Santillan, J.J.¹ Kobayashi, S.² Itani, T.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.