Dependence of linewidth and its edge roughness on electron beam exposure dose

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2775-2779

  Kotera, M ^a   Yagura, K ^a   Niu, H ^a  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DOSIMETRY; ELECTRON SCATTERING; MATHEMATICAL MODELS; POLYMETHYL METHACRYLATES; SILICON; SUBSTRATES; SURFACE ROUGHNESS;

EDGE ROUGHNESS; ELECTRON BEAM EXPOSURE DOSES; RESIST FILMS; THRESHOLD ENERGY MODELS;

ELECTRON BEAM LITHOGRAPHY;

EID: 29044448548     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2130357     Document Type: Article

References (7)

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