X-ray reflectivity study on depth profile of acid generator distribution in chemically amplified resists

Applied Physics Express

Volumn 1, Issue 6, 2008, Pages 0650041-0650043

  Fukuyama, Takehiro ^a   Kozawa, Takahiro ^a   Tagawa, Seiichi ^a   Takasu, Ryoichi ^b   Yukawa, Hiroto ^b   Sato, Mitsuru ^b   Onodera, Junichi ^b   Hirosawa, Ichiro ^c   Koganesawa, Tomoyuki ^c   Horie, Kazuyuki ^c  

^a OSAKA UNIVERSITY   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

^c JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLARIFICATION; ELECTRON BEAM LITHOGRAPHY; PHOTORESISTORS; PHOTORESISTS; REFLECTION; SEMICONDUCTING INDIUM; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICES; X RAY DIFFRACTION;

ACID GENERATORS; CHEMICALLY AMPLIFIED RESISTS; DEPTH PROFILES; FEATURE SIZES; LATERAL DIMENSIONS; MASS PRODUCTIONS; MOLECULAR SCALES; RESIST COMPONENTS; RESIST FILMS; RESIST THICKNESSES; ULTRAFINE; X-RAY REFLECTIVITIES;

ACIDS;

EID: 57649106769     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.065004     Document Type: Article

References (25)

1. H. Ito and C. G. Willson: Polym. Eng. Sci. 23 (1983) 1012.
2. H. Ito: Microlithography (Springer, Berlin. 2005) Advances in Polymer Science Series, Vol. 172, p. 37.
3. D. R. McKean, R. D. Allen, P. H. Kasai, U. P. Schaedeli, and S. A. MacDonald: Proc. SPIE 1672 (1992) 94.
4. S. J. Limb, B. E. Scruggs, and K. K. Gleason: Maeromolecules 26 (1993) 3750.
5. D. L. VanderHart, V. M. Prabhu, and E. K. Lin: Chem. Mater. 16 (2004) 3074.
6. J. L. Lenhart, D. A. Fischer, S. Sambasivan, E. K. Lin, R. L. Jones, C. L. Soles, W. Wu, D. L. Goldfarb, and M. Angelopoulos: Langmuir 21 (2005) 4007.
7. H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, and H. Komano: Jpn. J. Appl. Phys. 44 (2005) 5836.
8. W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank: J. Vac, Sci. Technol. B 16 (1998) 3689.
9. G. W. Reynolds and J. W. Taylor: J. Vac. Sci. Technol. B 17 (1999) 334.
10. J. Shin, G. Han, Y. Ma, K. Moloni, and F. Cerrina: J. Vac. Sci. Technol. B 19(2001) 2890.
11. G. M. Gallatin: Proc. SPIE 5754 (2005) 38.
12. T. Kozawa. H. Yamamoto, A. Saeki, and S. Tagawa: J. Vac. Sci. Technol. B 23(2005) 2716.
13. T. Hirayama, D. Shiono, S. Matsumaru, T. Ogata, H. Hada, J. Onodera, T. Arai, T. Sakamizu, A. Yamaguchi, H. Shiraishi, H. Fukuda, and M. Ueda: Jpn. J. Appl. Phys. 44 (2005) 5484.
14. T. Hirayama, D. Shiono, J. Onodera, A. Yamaguchi, and H. Fukuda: Polym. Adv. Technol. 17 (2006) 116.
15. C. L. Soles, E. K. Lin, J. L. Lenhart, R. L. Jones. W. Wu, D. L. Goldfarb, and M. Angelopoulos: J. Vac. Sci. Technol. B 19 (2001) 2690.
16. E. K. Lin, C. L. Soles, D. L. Goldfarb, B. C. Trinque, S. D. Burns, R. L. Jones, J. L. Lenhart, M. Angelopoulos, C. G. Willson, S. K. Satija, and W. Wu: Science 297 (2002) 372.
17. T. Kozawa, S. Tagawa, and M. Shell: Jpn. J. Appl. Phys. 46 (2007) L1143.
18. T. Kozawa, S. Tagawa, and M. Shell: J. Appl. Phys. 103 (2008) 084306.
19. L. G. Parratt: Phys. Rev. 95 (1954) 359.
20. M. K. Sanyal. J. K. Basu, A. Datta, and S. Banerjee: Europhys. Lett. 36 (1996) 265.
21. A. Lee, L. Hamon, Y. Holl, and Y. Grohens: Langmuir 17 (2001) 7664.
22. E. K. Lin, W. Wu, and S. K. Satija: Macromolecules 30 (1997) 7224.
23. C. Bollinne, V. W. Stone, V. Carlier, and A. M. Jonas: Macromolecules 32 (1999) 4719.
24. D. S. Fryer, P. F. Nealey, and J. J. Pablo: J. Vae. Sci. Technol. B 18 (2000) 3376.
25. J. T. Koberstein: J. Polym. Sci., Part B 42 (2004) 2942.