Contributions of resist polymers to innate material roughness

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2281-2289

  Fedynyshyn, Theodore H ^a   Astolfi, David K ^a   Goodman, Russell B ^a   Cann, Susan ^a   Roberts, Jeanette ^a,b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCES; COMPLEX RELATIONSHIPS; DEEP ULTRAVIOLETS; EXTREME ULTRAVIOLETS; FLUORO POLYMERS; FUNDAMENTAL LAWS; FUNDAMENTAL LIMITS; INVERSE RELATIONSHIPS; MATERIAL COMBINATIONS; MATERIAL PROPERTIES; METHACRYLATE POLYMERS; NEW MATERIALS; REPRESENTATIVE SAMPLINGS; RESIST FORMULATIONS; RESIST POLYMERS; RESIST PROCESSES; RESIST SENSITIVITIES;

ELECTRON BEAM LITHOGRAPHY; POLYMERS; ROUGHNESS MEASUREMENT; SURFACE ROUGHNESS; TERPOLYMERS; ULTRAVIOLET DEVICES;

PHOTORESISTS;

EID: 57249086342     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2993259     Document Type: Article

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