Extreme ultraviolet lithography: From research to manufacturing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2089-2093

  La Fontaine, Bruno ^a   Deng, Yunfei ^a   Kim, Ryoung Han ^a   Levinson, Harry J ^a   Okoroanyanwu, Uzodinma ^a   Sandberg, Richard ^a,b   Wallow, Tom ^a   Wood, Obert ^a  

^a ADVANCED MICRO DEVICES   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMMERCIAL SCANNERS; SCANNER MIRRORS; SEMICONDUCTOR MANUFACTURING;

FIBER LASERS; LASER PRODUCED PLASMAS; MIRRORS; PROBLEM SOLVING; SEMICONDUCTOR MATERIALS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 37149028446     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2794061     Document Type: Article

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