Electrical characteristics of arc-free high-power pulsed sputtering glow plasma

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5246-5250

  Yukimura, K ^a   Mieda, R ^a   Tamagaki, H ^b   Okimoto, T ^b  

^a DOSHISHA UNIVERSITY   (Japan)

^b Machinery and Engineering Company   (Japan)

Author keywords

HIPIMS; HPPMS; HPPS; Magnetron sputtering; Pulsed glow

Indexed keywords

ACTIVE FILTERS; ARGON; BIPOLAR TRANSISTORS; CAVITY RESONATORS; DISCHARGE (FLUID MECHANICS); ELECTRIC FIELDS; ELECTROMAGNETIC FIELD THEORY; ELECTROMAGNETIC FIELDS; GLOW DISCHARGES; INERT GASES; INSULATED GATE BIPOLAR TRANSISTORS (IGBT); MAGNETIC FIELDS; PLASMAS;

ARGON IONS; ELECTRICAL CHARACTERISTICS; HIGH POWERS; HIGHLY IONIZED; HIPIMS; HPPMS; HPPS; INSULATED-GATE; MAGNETRON SPUTTERING; PENNING DISCHARGE; PLASMA GENERATION; POWER SUPPLIES; PULSE WIDTH; PULSED GLOW; PULSED SPUTTERING; SPUTTERING TARGETS;

ELECTRIC DISCHARGES;

EID: 50649105486     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.021     Document Type: Article

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