AFM method for sidewall measurement through CNT probe deformation correction and its accuracy evaluation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7272, Issue , 2009, Pages

  Watanabe, Masahiro ^a   Baba, Shuichi ^a   Nakata, Toshihiko ^a   Itoh, Hiroshi ^c   Morimoto, Takafumi ^b   Sekino, Satoshi ^b  

^a HITACHI LTD   (Japan)

^b Hitachi Construction Machinery Co Ltd   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

AFM; CNT probe; Critical dimension (CD); Deconvolution; Sidewall profile

Indexed keywords

13.5 NM; 32-NM NODE; ACCURACY EVALUATION; AFM; ATOMIC FORCE MICROSCOPES; CD BIAS; CNT PROBE; CONVENTIONAL METHODS; CRITICAL DIMENSION; CRITICAL DIMENSION (CD); DECONVOLUTION METHOD; DEFORMATION CORRECTIONS; DEFORMATION EFFECTS; DENSE PATTERNS; HIGH ASPECT RATIO; HIGH STIFFNESS; LINE FEATURES; LINE-AND-SPACE; NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY; PROBE SHAPE; PROBE TIPS; SCANNING METHODS; SIDEWALL PROFILE; SIDEWALL PROFILES; TIP CHARACTERIZER; TORSIONAL MOTION; VAN DER WAALS ATTRACTIVE FORCE;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; CONVOLUTION; DATA STORAGE EQUIPMENT; DECONVOLUTION; DEFLECTION (STRUCTURES); DEFORMATION; PHOTORESISTS; PROBES; PROCESS CONTROL; SPACE PLATFORMS; VAN DER WAALS FORCES;

SPACE PROBES;

EID: 66649129623     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813375     Document Type: Conference Paper

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