A novel AFM method for sidewall measurement of high-aspect ratio patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Watanabe, Masahiro ^a   Baba, Shuichi ^a   Nakata, Toshihiko ^a   Morimoto, Takafumi ^a   Sekino, Satoshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

AFM; CNT probe; Deconvolution; Sidewall profile

Indexed keywords

13.5 NM; 32-NM NODE; AFM; ATOMIC FORCE MICROSCOPES; CANTILEVER OSCILLATION; CD BIAS; CNT PROBE; DEFORMATION EFFECTS; DENSE PATTERNS; HIGH STIFFNESS; HIGH-ASPECT RATIO; MEASUREMENT POINTS; PROBE SHAPE; SAMPLE SURFACE; SCANNING METHODS; SCANNING MODE; SIDEWALL PROFILES; VAN DER WAALS ATTRACTIVE FORCE;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; DECONVOLUTION; DEFLECTION (STRUCTURES); DEFORMATION; NANOCANTILEVERS; PROCESS CONTROL; SCANNING; UNITS OF MEASUREMENT; VAN DER WAALS FORCES;

PROBES;

EID: 66649112650     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772712     Document Type: Conference Paper

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