New AFM imaging for observing a high aspect structure

Applied Surface Science

Volumn 188, Issue 3-4, 2002, Pages 467-473

  Hosaka, Sumio ^a   Morimoto, Takafumi ^b   Kuroda, Hiroshi ^b   Minomoto, Yasushi ^b   Kembo, Yukio ^b   Koyabu, Hirokazu ^c  

^a GUNMA UNIVERSITY   (Japan)

^b HITACHI LTD   (Japan)

^c Nissei Sangyo Co Ltd   (Japan)

Author keywords

3D imaging; 3D metrology; AFM; Digital probing mode; High aspect; In line monitor; Nanometer structure; Photoresist pattern; SPM; Step in mode; STI structure

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CRACK INITIATION; IMAGING TECHNIQUES; PATTERN RECOGNITION; SCANNING; SURFACE STRUCTURE;

DIGITAL PROBING MODE;

SURFACE TREATMENT;

EID: 0037187255     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00934-5     Document Type: Conference Paper

References (7)