Dimension controlled CNT probe of AFM metrology tool for 45-nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Sekino, Satoshi ^a   Morimoto, Takafumi ^a   Kurenuma, Toru ^a   Hirooka, Motoyuki ^a   Tanaka, Hiroki ^a  

^a HITACHI LTD   (Japan)

Author keywords

AFM; Carbon nanotube; Metrology; Process monitoring; Tip dimension; Tip shape

Indexed keywords

AFM; AFM PROBE; ATOMIC FORCE MICROSCOPES; ATTRACTIVE FORCE; CNT TIP; CYLINDRICAL SHAPES; HIGH ASPECT RATIO; HIGH RESOLUTION; HIGH STIFFNESS; LONG-TERM MEASUREMENTS; METROLOGY TOOLS; NON DESTRUCTIVE; PROBE TIPS; PROFILE MEASUREMENT; SAMPLE GEOMETRY; SCANNING METHODS; SCREENING TECHNIQUES; SEMICONDUCTOR MANUFACTURING; SHAPE-CONTROLLED; THREE-DIMENSIONAL MEASUREMENTS; TIP DIMENSION; TIP-SHAPE; UNOBSERVABLE;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; MANUFACTURE; MEASUREMENTS; NANOTECHNOLOGY; POTENTIAL FLOW; PROBES; PROCESS MONITORING; SEMICONDUCTOR DEVICE MANUFACTURE; STIFFNESS; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 66649092494     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772433     Document Type: Conference Paper

References (12)

1. International Technology Roadmap for Semiconductors 2006 Update, http://www.itrs.net.
2. A. Sugimoto, Y. Kembo, K. Watanabe, and T. Yaguchi, "Current Status and Outlook of 3D Inspection Analysis for Semiconductor Devices", Hitachi Review 55, pp. 56-60 (2006).
3. Hao-Chih Liu, David Fong, Gregory A. Dahlenmarc Osborn, Sean Hand, Jason R. Osbone, "Carbon Nanotube AFM Probes for Microlithography Process Control", Proc. SPIE 6152, 61522Y (2006).
4. B. C. Park, J. Kang, K. Y. Jung, W. Y. Song, B.-h. O, T. B. Eom, "Atomic Force Microscopy of Steep Side-walled Feature with Carbon Nanotube Tip", Proc. SPIE 5038, pp. 935-942 (2003).
5. T. Morimoto, T. Shinaki, Y. Kembo, S. Hosaka, "New atomic force microscope method for critical dimension metrology", Proc. SPIE 5038, pp. 636-643 (2003).
6. M. Watanabe, S. Baba, T. Nakata, T. Kurenuma, H. Kuroda, T. Hiroki, "An advanced AFM sensor for high-aspect ratio pattern profile in-line measurement", Proc. SPIE 6152, 61522A (2006).
7. M. Watanabe, S. Baba, T. Nakata, T. Kurenuma, Y. Kunitomo, M. Edamura, "An advanced AFM sensor: its profile accuracy and low probe wear property for high aspect ratio patterns", Proc. SPIE 6518, 65183L (2007).
8. M. Edamura, Y. Kunitomo, T. Morimoto, S. Sekino, T. Kurenuma, Y. Kembo, M. Watanabe, S. Baba, K. Hidaka, "New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond", Proc. SPIE 6518, 65183M (2007).
9. S. Iijima, "Helical microtubules of graphitic carbon", Nature 354, pp. 56-58 (1991). (Pubitemid 21896780)
10. J.S. Villarrubia, "Algorithms for Scanned Probe Microscope, Image Simulation, Surface Reconstruction and Tip Estimation", J. Nat. Inst. Stand. and Technol. 102, pp. 435-454 (1997).
11. S. Czerkas, T. Dziomba, H. Bosse, "Nanoscale Calibration Standards and Methods", Wiley-VCH Verlag GmbH, pp.311-320 (2006).
12. M. Watanabe, S. Baba, T. Nakata, T. Morimoto, S. Sekino, "A Novel AFM Method for Sidewall Measurement of High-Aspect Ratio Patterns", Proc. SPIE 6922, (2008). (To be published.).