New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 3, 2007, Pages

  Edamura, Manabu ^a   Kunitomo, Yuichi ^a   Morimoto, Takafumi ^a   Sekino, Satoshi ^a   Kurenuma, Toru ^a   Kembo, Yukio ^a   Watanabe, Masahiro ^a   Baba, Shuichi ^a   Hidaka, Kishio ^a  

^a HITACHI LTD   (Japan)

Author keywords

AFM; Carbon nanotube; CMP; Etching; High aspect ratio; Inline metrology; Lithography; Microlens; Roughness; SPM

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; ETCHING; LITHOGRAPHY; LSI CIRCUITS; MICROLENSES; PHOTORESISTORS; PROBES;

AFM METROLOGY; HIGH-PRECISION MEASUREMENT; HIGH-SPEED WAFER PROCESSING; INLINE METROLOGY; INLINE METROLOGY TOOL; LSI MANUFACTURING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 35148882631     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711676     Document Type: Conference Paper

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