Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns

Applied Physics Letters

Volumn 81, Issue 5, 2002, Pages 901-903

  Nguyen, Cattien V ^a   Stevens, Ramsey M D ^a   Barber, Jabulani ^a   Han, Jie ^a   Meyyappan, M ^a   Sanchez, Martha I ^b   Larson, Carl ^b   Hinsberg, William D ^b  

^a NASA AMES RESEARCH CENTER   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

193 NM PHOTORESISTS; 193-NM LITHOGRAPHY; CHARACTERIZATION TECHNIQUES; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; FEATURE SIZES; HIGH ASPECT RATIO; INTERFERENCE LITHOGRAPHY; NANOSCALE FEATURES; NANOSCALE REGIME; PHOTORESIST PATTERNS; SCALING DOWN; SCANNING PROBES; SURFACE PROFILES;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; NANOTECHNOLOGY; PHOTORESISTS; SCANNING;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 79955998904     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1496139     Document Type: Article

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