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Volumn 4689 I, Issue , 2002, Pages 492-499
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New AFM imaging for an in-line LSI process monitor
a a,b a,b a,b a,b a,c
b
HITACHI LTD
(Japan)
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Author keywords
3D imaging; 3D metrology; AFM; Digital probing mode; High aspect; In line monitor; Nanometer; SPM; Step in mode; STI
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Indexed keywords
ASPECT RATIO;
ATOMIC FORCE MICROSCOPY;
DRY ETCHING;
FRICTION;
IMAGING TECHNIQUES;
LSI CIRCUITS;
SCANNING;
SERVOMECHANISMS;
DIGITAL PROBING MODE;
PHOTORESISTS;
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EID: 0036031277
PISSN: 0277786X
EISSN: None
Source Type: Journal
DOI: 10.1117/12.473488 Document Type: Article |
Times cited : (7)
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References (12)
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