An image stitching method to eliminate the distortion of the sidewall in linewidth measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 363-373

  Zhao, Xuezeng ^b   Fu, Joseph ^a   Chu, Wei ^b   Nguyen, Cattien ^c   Vorburger, Theodore ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

^c NASA AMES RESEARCH CENTER   (United States)

Author keywords

Atomic force microscopy (AFM); Image registration; Image stitching method; Linewidth; Nanotube probe; Sidewall

Indexed keywords

IMAGE REGISTRATION; IMAGE STITCHING METHOD; LINEWIDTH; SIDEWALL;

ATOMIC FORCE MICROSCOPY; DATA STORAGE EQUIPMENT; HOLOGRAPHY; NANOTUBES; PROBLEM SOLVING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS;

LITHOGRAPHY;

EID: 4344693770     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536692     Document Type: Conference Paper

References (18)

1. R. Dixson, J. Schneir, T. McWaid, N. Sullivan, V. Tsai, S. Zaidi, S. Brueck. Toward accurate linewidth metrology using atomic force microscopy and tip characterization, Proc. SPIE 2725, 589 (1996).
2. J. Schneir, T. McWaid, R. Dixson, V. Tsai, J. Villarrubia, E. Williams, J. Fu. Progress on accurate metrology of pitch, height, roughness, and width artifacts using an atomic force microscope, Proc. SPIE 2439, 401 (1995).
3. R. Dixson, R. Köning, V. Tsai, J. Fu, T. Vorburger. Dimensional metrology with the NIST calibrated atomic force microscope, Proc. SPIE 3677, 20 (1999).
4. R. Dixson, N. Sullivan, J. Schneir, T. McWaid, V. Tsai, J. Prochazka, M. Young. Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology, Proc. SPIE 2725, 572 (1996).
5. P. Markiewicz, M. Goh. Atomic force microscopy probe tip visualization and improvement of images using a simple deconvolution procedure, Langmuir 10, 5 (1994).
6. J. Villarrubia. Scanned probe microscope tip characterization without calibrated tip characterizers, Journal of Vacuum Science & Technology 321, 1518 (1996).
7. J. Villarrubia. Morphological estimation of tip geometry for scanned probe microscopy, Surface Science 321, 287 (1994).
8. J. Villarrubia. A strategy for faster blind reconstruction of tip geometry for scanned probe microscopy, Proc. SPIE 3332, 10 (1998).
9. H. Dai, J. Hafner, A. Andrew, D. Colbert, R. Smalley. Nanotubes as nanoprobes in scanning probe microscopy, Nature 384, 147 (1996).
10. A. Cassell, L. Delzeit, C. Nguyen, R. Stevens, J. Han, M. Meyyappan. Carbon nanotubes by CVD and applications, Journal De Physique. IV: JP, 11, 3401 (2001).
11. C. Nguyen, K.-J. Chao, R. Stevens, L. Delzeit, A. Cassell, J. Han, M. Meyyappan. Carbon nanotube tip probes: Stability and lateral resolution in scanning probe microscopy and application to surface science in semiconductors, Nanotechnology 12, 363 (2001).
12. C. Nguyen, R. Stevens, J. Barber, J. Han, M. Meyyappan, M. Sanchez, C. Larson, W. Hinsberg. Carbon nanotube scanning probe for surface profiling of DUV and 193 nm photoresist pattern, Proc. SPIE 4689, 58 (2002).
13. R. Dixson, R. Köning, J. Fu, T. Vorburger, B. Renegar. Accurate dimensional metrology with atomic force microscopy, Proc. SPIE 3998, 362 (2000).
14. B.K.P. Horn. Closed-form solution of absolute orientation using unit quaternions, J. Opt. Soc. Am. A 4, 629 (1987).
15. P. Besl and N. Mckay. A Method for Registration of 3-D Shapes, IEEE TRANS. on PAMI 14, 239 (1992).
16. T. Greg and L. Marc. Zippered polygon meshes from range image. Proc. of SIGGRAPH ACM, (1994).
17. X. Zhao, T. Vorburger, J. Fu, J. Song and C. Nguyen. A Model for Step Height, Edge Slope and Linewidth Measurements Using AFM, AIP Conference Proc. 683, 400 (2003).
18. R. Allen, B. am Ende, M. Cresswell, C. Murabito, T. Headley, W. Guthrie, L. Linholm, C. Ellenwood, E. Bogardus. Test structures for reference electrical linewidth measurements to silicon lattice parameters using HRTEM. IEEE Trans. On Semiconductor Manufacturing 16, 239 (2003).