Application of model-based library approach to Si3N4 hardmask measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Tanaka, Maki ^a   Shishido, Chie ^a   Nagatomo, Wataru ^a   Watanabe, Kenji ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

CD SEM; Hardmask metrology; Measurement bias; Model based library; Monte Carlo simulation

Indexed keywords

CD-SEM; HARDMASKS; MEASUREMENT BIAS; MODEL-BASED LIBRARY; MONTE CARLO SIMULATION;

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ELECTRON MICROSCOPES; ENERGY DISSIPATION; MEASUREMENTS; MONTE CARLO METHODS; PARAMETER ESTIMATION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 66649124362     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772097     Document Type: Conference Paper

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