Influence of O+2 energy, flux, and fluence on the formation and growth of sputtering-induced ripple topography on silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 5, 1996, Pages 2709-2720

  Vajo, John J ^a   Doty, Robert E ^a   Cirlin, Eun Hee ^a  

^a Hughes Aircraft Co   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030486547     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580192     Document Type: Article

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