Characterization of photoresist spatial resolution by interferometric lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 464-472

  Hoffnagle, John A ^a   Hinsberg, William D ^a   Houle, Frances A ^a   Sanchez, Martha I ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Interferometric lithography; Materials characterization; Modulation transfer function; Photoresist

Indexed keywords

AVAILABILITY; FOURIER OPTICS; IMAGING SYSTEMS; INTERFEROMETRY; OPTICAL TRANSFER FUNCTION; PHOTOLITHOGRAPHY;

INTERFEROMETRIC LITHOGRAPHY; LINE SPREAD FUNCTION;

PHOTORESISTS;

EID: 0141611994     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485015     Document Type: Conference Paper

References (12)

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