Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2295-2299

  Anderson, Christopher N ^a   Naulleau, Patrick P ^b   Niakoula, Dimitra ^b,c   Hassanein, Elsayed ^c   Brainard, Robert ^c   Gallatin, Gregg ^d   Dean, Kim ^e  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c STATE UNIVERSITY OF NEW YORK   (United States)

^d Applied Math Solutions LLC   (United States)

^e SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLUR METRIC; DE PROTECTIONS; EXTREME ULTRAVIOLETS; LINE EDGE ROUGHNESSES; PHOTOACID GENERATORS; SPACE FEATURES; SPATIAL DISTRIBUTION OF;

PHOTORESISTS; ROUGHNESS MEASUREMENT; SHOT NOISE; SIZE DISTRIBUTION;

PHOTORESISTORS;

EID: 57249103667     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2968615     Document Type: Article

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