Resist effects at small pitches

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 1, 2006, Pages 316-320

  Van Steenwinckel, David ^a   Lammers, Jeroen H ^a   Koehler, Thomas ^b   Brainard, Robert L ^b   Trefonas, Peter ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b ROHM AND HAAS COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOORE'S LAW; PITCHES; PROCESS CAPABILITY;

CORRELATION THEORY; LITHOGRAPHY; MATRIX ALGEBRA; NANOSTRUCTURED MATERIALS; PHOTORESISTS; ULTRAVIOLET RADIATION;

MICROELECTRONICS;

EID: 31544471716     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2151912     Document Type: Article

References (7)

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2. P. Dirksen, J. Braat, A. J. E. M. Janssen, H. Kwinten, D. Van Steenwinckel, and A. Leeuwestein, Proc. SPIE 5377, 150 (2004).
3. P. Dirksen, J. J. Braat, A. J. Janssen, and A. Leeuwestein, Proc. SPIE 5754, 262 (2005).
4. T. Brunner, C. Fonseca, N. Seong, and M. Burkhardt, Proc. SPIE 5377, 141 (2004).
5. B. W. Smith, in Microlithography-Science and Technology, edited by, J. R. Sheats, and, B. W. Smith, (Dekker, New York, 1998), p. 208.
6. U. Okoroanyanwu and J. H. Lammers, Future Fab Int'l 17, 68 (2004).
7. R. L. Brainard, P. Trefonas, J. H. Lammers, C. A. Cutler, J. F. Mackevich, A. Trefonas, and S. A. Robertson, Proc. SPIE 5374, 74 (2004).