Absolute sensitivity calibration of extreme ultraviolet photoresists

Optics Express

Volumn 16, Issue 15, 2008, Pages 11519-11524

  Naulleau, Patrick P ^a   Gullikson, Eric M ^a   Aquila, Andy ^a   George, Simi ^a   Niakoula, Dimitra ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES; PHOTORESISTS;

ADVANCED LIGHT SOURCE; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; LINE EDGE ROUGHNESS; RESIST SENSITIVITY; RESOLUTION REQUIREMENTS; SANDIA NATIONAL LABORATORIES; SENSITIVITY CALIBRATION;

CALIBRATION;

ARTICLE; CALIBRATION; MATERIALS TESTING; METHODOLOGY; PHOTOCHEMISTRY; PHOTOGRAPHY; STANDARD; ULTRAVIOLET RADIATION; UNITED STATES;

CALIBRATION; MATERIALS TESTING; PHOTOCHEMISTRY; PHOTOGRAPHY; ULTRAVIOLET RAYS; UNITED STATES;

EID: 47849095449     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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