Deprotection blur in extreme ultraviolet photoresists: Influence of base loading and post-exposure bake temperature

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 1, 2009, Pages 6-10

  Anderson, Christopher N ^a   Naulleau, Patrick P ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DE PROTECTIONS; EXTREME ULTRA VIOLETS; LINE-EDGE ROUGHNESS; POST-EXPOSURE BAKE TEMPERATURES; ROHM AND HAAS; WEIGHT PERCENTS;

LASER PULSES; PHOTORESISTORS; SURFACE TREATMENT; ULTRAVIOLET DEVICES;

WINDOWS OPERATING SYSTEM;

EID: 59949092905     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3032901     Document Type: Article

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