Extreme ultraviolet interference lithography with incoherent light

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Naulleau, Patrick P ^a   Anderson, Christopher N ^b   Horne, Stephen F ^c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c ENERGETIQ TECHNOLOGY INC   (United States)

Author keywords

Coherence; Extreme ultraviolet; Interferometry; Lithography

Indexed keywords

COMMERCIALIZATION; EUV INTERFERENCE LITHOGRAPHY TOOLS; MICROFIELD TOOLS;

COHERENT LIGHT; INTERFEROMETRY; LIGHT SOURCES; SYNCHROTRONS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148883020     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.715069     Document Type: Conference Paper

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