Plasma deposition of fluorocarbon thin films using pulsed /continuous and downstream radio frequency plasmas

Thin Solid Films

Volumn 517, Issue 9, 2009, Pages 3011-3019

  Liu, Dongping ^a   Gu, Jiandong ^a,b   Feng, Zhiqing ^a   Li, Dongming ^b   Niu, Jinhai ^a  

^a DALIAN NATIONALITIES UNIVERSITY   (China)

^b DALIAN JIAOTONG UNIVERSITY   (China)

Author keywords

Atomic force microscopy; Chemical vapor deposition; Fluorocarbon films; Optical emission spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GROWTH (MATERIALS); HYDROGEN; INFRARED SPECTROSCOPY; LASER OPTICS; LIGHT EMISSION; MOLECULAR BEAM EPITAXY; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; OPTICAL MICROSCOPY; PHOTORESISTS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; RADIO; RADIO WAVES; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; SURFACE DIFFUSION; SURFACE ROUGHNESS; SURFACE STRUCTURE; VAPORS;

ADSORBED SPECIES; CARBON-CONTAINING SPECIES; CONTINUOUS-WAVES; DIFLUOROMETHANE; DISCHARGE MODES; DOWN-STREAM PLASMAS; EMISSION INTENSITIES; ENERGETIC IONS; EXCITATION TEMPERATURES; FILM PROPERTIES; FILM STRUCTURES; FLUOROCARBON FILMS; FLUOROCARBON THIN FILMS; FOURIER TRANSFORM INFRARED; GAS-PHASE; GROWTH PROCESS; IN-SITU; LOW ENERGIES; PLASMA PARAMETERS; PULSED DEPOSITIONS; RADIO FREQUENCIES; RADIO FREQUENCY PLASMAS; RELATIVE EMISSIONS; ROUGH SURFACES; SYNERGISTIC EFFECTS;

OPTICAL FILMS;

EID: 60249084451     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.105     Document Type: Article

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