Surface morphology of PECVD fluorocarbon thin films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane

Journal of Applied Polymer Science

Volumn 74, Issue 10, 1999, Pages 2439-2447

  Labelle, Catherine B ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FILM GROWTH; FLUOROCARBONS; HYDROPHOBICITY; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON WAFERS; SURFACE ROUGHNESS; SURFACE TREATMENT; THIN FILMS;

DIFLUOROMETHANE; HEXAFLUOROPROPYLENE OXIDE; TETRAFLUOROETHANE;

DIELECTRIC FILMS;

EID: 0032596093     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19991205)74:10<2439::AID-APP12>3.0.CO;2-6     Document Type: Article

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