Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions

Applied Surface Science

Volumn 162, Issue , 2000, Pages 280-292

  Ferguson, J D ^a   Weimer, A W ^b   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIDES; PARTICLES (PARTICULATE MATTER); SILICA; SURFACE CHEMISTRY; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION; SEQUENTIAL SURFACE REACTIONS;

CERAMIC COATINGS;

EID: 0034250045     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00205-1     Document Type: Article

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