Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2394-2398

  Schvartzman, M ^a,b   Mathur, A ^d   Kang, Y ^d   Jahnes, C ^c   Hone, J ^a,b   Wind, S J ^a,b  

^a Columbia University ^*  (United States)

^b Och Spine at New York Presbyterian Hospitals   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND-LIKE CARBONS; FLUORINATED DIAMONDLIKE CARBONS; FLUOROCARBON PLASMA TREATMENTS; HIGH RESOLUTIONS; OXYGEN PLASMA ETCHINGS; PLASMA TREATMENTS; THIN LAYERS;

CARBON FILMS; ELECTRIC LOAD MANAGEMENT; ETCHING; OXYGEN; PLASMA APPLICATIONS; PLASMA ETCHING; PLASMAS; POLYMERS; SILICON; SURFACE TREATMENT;

NANOIMPRINT LITHOGRAPHY;

EID: 57249094069     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3013281     Document Type: Article

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