Structure and stability characterization of anti-adhesion self-assembled monolayers formed by vapour deposition for NIL use

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Garidel, R Sophie ^a   Zelsmann, Marc ^b   Voisin, Pauline ^a,b,c   Rochat, Nevine ^a   Michallon, Philippe ^a  

^a CEA LETI   (France)

^b CNRS   (France)

^c STMICROELECTRONICS   (France)

Author keywords

Anti adhesive properties; Self assembled monolayers; Step and repeat UVNIL process

Indexed keywords

ATOMIC FORCE MICROSCOPY; FLUORINATION; FOURIER TRANSFORMS; NANOIMPRINT LITHOGRAPHY; VAPOR DEPOSITION;

ANTI ADHESIVE LAYERS; ANTI-ADHESIVE PROPERTIES; UVNIL PROCESSES;

SELF ASSEMBLED MONOLAYERS;

FLUORINATION; LITHOGRAPHY; MONOLAYERS;

EID: 35148824514     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711417     Document Type: Conference Paper

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