Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 5, 2003, Pages 2018-2025

  Henschel, W ^a   Georgiev, Y M ^a   Kurz, H ^a  

^a AMO GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; HYDROGEN BONDS; OLIGOMERS; ORGANIC COMPOUNDS; SCANNING ELECTRON MICROSCOPY; STRUCTURE (COMPOSITION); TEMPERATURE;

ELASTIC RECOIL DETECTION ANALYSIS; HYDROGEN SILSESQUIOXANE; NEGATIVE TONE ELECTRON BEAM RESIST; TETRAMETHYL AMMONIUM HYDROXIDE;

HYDROGEN INORGANIC COMPOUNDS;

EID: 0242425719     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1603284     Document Type: Article

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