Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 7070-7074

  Taniguchi, Jun ^a   Tokano, Yuji ^a   Miyamoto, Iwao ^a   Komuro, Masanori ^b   Hiroshima, Hiroshi ^b   Kobayashi, Kazuhiko ^c   Miyazaki, Takeshi ^c   Ohyi, Hideyuki ^c  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c CRESTEC   (Japan)

Author keywords

Atomic force microscope; Diamond mold; Lift off; Nanoimprint lithography; Polymethylmethacrylate

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; PHOTORESISTS; POLYMETHYL METHACRYLATES; SEMICONDUCTING DIAMONDS; SUBSTRATES;

DIAMOND MOLDS; NANOIMPRINT LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034428091     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.7070     Document Type: Article

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